期刊
APPLIED PHYSICS LETTERS
卷 94, 期 9, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3093489
关键词
aluminium compounds; band structure; electroluminescence; electron-hole recombination; elemental semiconductors; gold; III-V semiconductors; interface structure; light emitting diodes; MOCVD; semiconductor growth; semiconductor thin films; silicon; ultraviolet spectra; wide band gap semiconductors
Undoped AlN thin film has been grown on p-Si (111) by metal-organic chemical-vapor deposition. The p-Si/AlN/Au heterostructured light-emitting diode was further fabricated and investigated. The current-voltage characteristic showed a typical back-to-back diode behavior, which is responsible for the electroluminescence at both forward and reverse bias. A deep UV emission at 283 nm as well as a UV emission at 380 nm was observed from the forward biased p-Si/AlN/Au diode, while a blue emission at 490 nm was detected from the diode under reverse bias. The recombination mechanism for each emission band was discussed based on the energy band diagram.
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