期刊
APPLIED PHYSICS LETTERS
卷 95, 期 5, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3202392
关键词
dielectric hysteresis; dielectric thin films; hafnium compounds; optical harmonic generation; photoelectron spectra; photoemission; photoionisation; point defects; silicon; silicon compounds; tunnelling; two-photon processes
资金
- NSF [DMR-0706227]
- Robert Welch Foundation [F-1038]
Internal multiphoton photoemission (IMPE) and time-dependent electrostatic field-induced second-harmonic (TD-EFISH) generation are used to probe charge trapping kinetics in Si/SiO2/Hf1-xSixO2 films. For as-deposited Si/SiO2/HfO2 samples, we observe a unique resonant TD-EFISH response to IMPE charging at incident photon energies near 1.6 eV: a delayed TD-EFISH decay not observed at off resonant energies or in x not equal 0 samples. We explain the TD-EFISH decay by resonant two-photon ionization of point defects and subsequent tunneling of the photoelectrons to the Si substrate. Hysteresis in the resonant TD-EFISH response shows that the photoionized defects are rechargeable and located within the HfO2 bulk.
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