4.6 Article

Unified retention model for localized charge trapping nonvolatile memory device

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APPLIED PHYSICS LETTERS
卷 92, 期 13, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.2906895

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Retention after cycling in an NROM nonvolatile memory cell is investigated. Electrical characterizations combined with two-dimensional simulations were employed. By combining subthreshold current characterizations with gate-induced drain leakage measurements, the retention loss mechanisms are quantified and differentiated. A unified retention model for the NROM technology is proposed, incorporating both lateral charge transport in the nitride layer and hot carrier-induced interface-states formation. The fabrication conditions in the various studies reported in the literature and the resultant impact on interface-states formation are most likely the cause of the formally nonresolved debate regarding the origin of retention loss in NROM technology. (C) 2008 American Institute of Physics.

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