Surface passivation and heterojunction cells on Si (100) and (111) wafers using dc and rf plasma deposited Si:H thin films

标题
Surface passivation and heterojunction cells on Si (100) and (111) wafers using dc and rf plasma deposited Si:H thin films
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 92, Issue 6, Pages 063504
出版商
AIP Publishing
发表日期
2008-02-15
DOI
10.1063/1.2857465

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