Mg composition dependent strain analysis in nonpolar a-plane MgxZn1-xO films

Nonpolar a-plane (1120) MgxZn1-xO (a-MgxZn1-xO) films are deposited on (0112) r-sapphire substrates using metalorganic chemical vapor deposition with varying Mg composition (x from 0 to 0.25). Unit cell parameters with Mg composition are determined by high-resolution triple-axis x-ray diffraction. In-plane strain along the c-axis [0001] and m-axis [1100] in the films is anisotropic and increases with increasing Mg composition. The in-plane strain anisotropy changes with Mg composition in a-MgxZn1-xO. Calculations are carried out to determine the influence of Mg content on the residual interfacial strain. (c) 2008 American Institute of Physics.