An evaluation of thermal stability of TiB2 metal gate on Hf silicate for p-channel metal oxide semiconductor application

标题
An evaluation of thermal stability of TiB2 metal gate on Hf silicate for p-channel metal oxide semiconductor application
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 92, Issue 17, Pages 172106
出版商
AIP Publishing
发表日期
2008-05-04
DOI
10.1063/1.2913766

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