Controlled focused electron beam-induced etching for the fabrication of sub-beam-size nanoholes

标题
Controlled focused electron beam-induced etching for the fabrication of sub-beam-size nanoholes
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 92, Issue 4, Pages 043124
出版商
AIP Publishing
发表日期
2008-02-01
DOI
10.1063/1.2839334

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