Effects of postnitridation annealing on band gap and band offsets of nitrided Hf-silicate films

标题
Effects of postnitridation annealing on band gap and band offsets of nitrided Hf-silicate films
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 92, Issue 2, Pages 022907
出版商
AIP Publishing
发表日期
2008-01-18
DOI
10.1063/1.2826271

向作者/读者发起求助以获取更多资源

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started