期刊
APPLIED PHYSICS LETTERS
卷 93, 期 25, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3054347
关键词
buffer layers; electrodes; elemental semiconductors; II-VI semiconductors; magnesium compounds; ohmic contacts; pulsed laser deposition; semiconductor epitaxial layers; semiconductor growth; semiconductor heterojunctions; semiconductor-insulator-semiconductor structures; silicon; titanium compounds; transmission electron microscopy; vapour phase epitaxial growth; wide band gap semiconductors; X-ray diffraction; zinc compounds
In this work, the electronic properties of Mg0.1Zn0.9O/TiN/Si(111) heterostructures processed using pulsed laser deposition were examined. X-ray diffraction and transmission electron microscopy studies demonstrated epitaxial growth of the titanium nitride buffer layer and the Mg0.1Zn0.9O thin film. Transmission electron microscopy demonstrated a thin (similar to 5 nm) spinel layer along the magnesium zinc oxide/titanium nitride interface. Current-voltage measurements revealed Ohmic contact behavior through the magnesium zinc oxide/titanium nitride interface. These results suggest that the titanium nitride buffer layer in the MgxZn1-xO/TiN/Si(111) heterostructure provides a buffer layer for integrating magnesium zinc oxide thin films with silicon substrates, which both enable epitaxial growth and serve as an Ohmic electrode for the magnesium zinc oxide thin film.
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