In situ metal-organic chemical vapor deposition atomic-layer deposition of aluminum oxide on GaAs using trimethyaluminum and isopropanol precursors

标题
In situ metal-organic chemical vapor deposition atomic-layer deposition of aluminum oxide on GaAs using trimethyaluminum and isopropanol precursors
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 93, Issue 3, Pages 031902
出版商
AIP Publishing
发表日期
2008-07-29
DOI
10.1063/1.2960574

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