期刊
APPLIED PHYSICS EXPRESS
卷 7, 期 9, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.7567/APEX.7.095501
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资金
- MRSEC Program of the National Science Foundation [DMR 1121053]
- JSPS
beta-Ga2O3(010) homo-epitaxial growth was performed by plasma-assisted molecular beam epitaxy. Under Ga-rich conditions and for growth temperatures above 650 degrees C, the growth rate was independent of the Ga/O ratio (>1). A high growth rate of 2.2 nm/min for beta-Ga2O3(010) was achieved by optimizing the O flux between 650 and 750 degrees C. Under Ga-rich conditions between growth temperatures of 500-900 degrees C, smooth surfaces with rms roughness below 1 nm were realized. We found that the slightly Ga-rich conditions between 650 and 750 degrees C were optimal for beta-Ga2O3(010) growth with a smooth surface and a high growth rate. (C) 2014 The Japan Society of Applied Physics
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