4.5 Article

Raman Scattering Spectroscopy of Residual Stresses in Epitaxial AlN Films

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APPLIED PHYSICS EXPRESS
卷 4, 期 3, 页码 -

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IOP PUBLISHING LTD
DOI: 10.1143/APEX.4.031001

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  1. (Tokai Region) of the Ministry of Education, Culture, Sports, Science and Technology, Japan
  2. [21360007]
  3. [21560014]
  4. [18069006]

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High-crystalline-quality epitaxial films of wurtzite AlN were grown by metalorganic vapor phase epitaxy (MOVPE) and hydride vapor phase epitaxy (HVPE). The lattice strain of the films was analyzed by high-resolution X-ray diffraction and the E-2 (high)-phonon frequency was observed by Raman scattering. Data analysis for wide ranges of lattice strains and phonon-peak shifts yielded a precise biaxial stress coefficient of this phonon mode, -4.04 +/- 0.3 cm(-1)/GPa. Furthermore, the deformation potential constant was accurately determined from the biaxial stress coefficient. (C) 2011 The Japan Society of Applied Physics

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