期刊
APPLIED PHYSICS EXPRESS
卷 1, 期 12, 页码 -出版社
JAPAN SOCIETY APPLIED PHYSICS
DOI: 10.1143/APEX.1.121701
关键词
-
资金
- Spanish Ministry of Science [MAT2005-02047, NAN2004-09133-C03-01, CSD2007-00041]
- Consejo Superior de Investigaciones Cientificas [PIE 2007601023]
- Generalitat de Catalunya [SGR-0029]
- European Union
We present a general methodology to study the morphology of complex thin film surfaces by evaluating the percentage of flat area through the use of atomic force microscopy. We prove that this is the key parameter to assess the suitability of a layer and ensure the desired epitaxy of the subsequent layer in a heterostructure. The method has been verified by applying it to chemically deposited YBa(2)Cu(3)O(7) (YBCO) superconducting films grown on buffer layers with different surface morphologies. We demonstrate that, indeed, YBCO self-field critical current density is controlled by the buffer layer flat area fraction. (C) 2008 The Japan Society of Applied Physics
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据