Extending standard mask lithography exposure technique to spherical surfaces

标题
Extending standard mask lithography exposure technique to spherical surfaces
作者
关键词
Spherical Surface, Ceric Ammonium Nitrate, Lens Array, Mask Aligner, Laser Writer
出版物
APPLIED PHYSICS B-LASERS AND OPTICS
Volume 115, Issue 3, Pages 371-377
出版商
Springer Nature
发表日期
2013-08-24
DOI
10.1007/s00340-013-5612-1

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