Laser-induced local dehydroxylation on surface-oxidized silicon substrates: mechanistic aspects and prospects in nanofabrication

Processing of silicon oxide surfaces with a focused laser beam at a wavelength of 514 nm has been investigated. Laser processing of native silicon samples (d(ox) = 1-2 nm) allows the fabrication of reactive templates with laterally varying hydroxyl group density. Very similar results were also obtained on thermally oxidized silicon samples (d(ox) approximate to 100 nm), whereas respective experiments on quartz plates have failed. These results support a photothermal mechanism where laser irradiation causes a local temperature rise and initiates dehydroxylation. In agreement with a photothermally induced dehydroxylation reaction, a thermokinetic analysis of the experimental data points to a highly activated process. In conjunction with site-selective functionalization routines this opens up an avenue towards functional surface structures with lateral dimensions significantly below the optical diffraction limit.