期刊
ADVANCED MATERIALS
卷 20, 期 10, 页码 1934-+出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200701994
关键词
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The cross-sectional TEM image shows that line-space patterns can be directly imprinted, with high fidelity, into highly porous spin-on organosilicate materials. This publication quantifies how the porosity and distribution of pores within the patterns are affected by the nanoimprint lithography processes, including evidence for a densified pattern surface.
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