Interfacial Strain-Induced Oxygen Disorder as the Cause of Enhanced Critical Current Density in Superconducting Thin Films

标题
Interfacial Strain-Induced Oxygen Disorder as the Cause of Enhanced Critical Current Density in Superconducting Thin Films
作者
关键词
-
出版物
ADVANCED FUNCTIONAL MATERIALS
Volume 19, Issue 6, Pages 835-841
出版商
Wiley
发表日期
2009-02-02
DOI
10.1002/adfm.200801112

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