Structure and Electrical Properties of Al-Doped HfO2 and ZrO2 Films Grown via Atomic Layer Deposition on Mo Electrodes

标题
Structure and Electrical Properties of Al-Doped HfO2 and ZrO2 Films Grown via Atomic Layer Deposition on Mo Electrodes
作者
关键词
-
出版物
ACS Applied Materials & Interfaces
Volume 6, Issue 24, Pages 22474-22482
出版商
American Chemical Society (ACS)
发表日期
2014-11-26
DOI
10.1021/am506525s

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