Solution-Deposited F:SnO2/TiO2 as a Base-Stable Protective Layer and Antireflective Coating for Microtextured Buried-Junction H2-evolving Si Photocathodes

标题
Solution-Deposited F:SnO2/TiO2 as a Base-Stable Protective Layer and Antireflective Coating for Microtextured Buried-Junction H2-evolving Si Photocathodes
作者
关键词
-
出版物
ACS Applied Materials & Interfaces
Volume 6, Issue 24, Pages 22830-22837
出版商
American Chemical Society (ACS)
发表日期
2014-12-03
DOI
10.1021/am506999p

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