X-ray Photoelectron Spectroscopy Depth Profiling of La2O3/Si Thin Films Deposited by Reactive Magnetron Sputtering

标题
X-ray Photoelectron Spectroscopy Depth Profiling of La2O3/Si Thin Films Deposited by Reactive Magnetron Sputtering
作者
关键词
-
出版物
ACS Applied Materials & Interfaces
Volume 3, Issue 11, Pages 4370-4373
出版商
American Chemical Society (ACS)
发表日期
2011-10-04
DOI
10.1021/am201021m

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