Morphology, Bandgap, and Grain Size Tailoring in Cu2O Thin Film by SILAR Method

标题
Morphology, Bandgap, and Grain Size Tailoring in Cu2O Thin Film by SILAR Method
作者
关键词
-
出版物
IEEE TRANSACTIONS ON NANOTECHNOLOGY
Volume 14, Issue 1, Pages 108-112
出版商
Institute of Electrical and Electronics Engineers (IEEE)
发表日期
2014-11-12
DOI
10.1109/tnano.2014.2369438

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