Benchmarking of MoS2FETs With Multigate Si-FET Options for 5 nm and Beyond

标题
Benchmarking of MoS2FETs With Multigate Si-FET Options for 5 nm and Beyond
作者
关键词
-
出版物
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 62, Issue 12, Pages 4051-4056
出版商
Institute of Electrical and Electronics Engineers (IEEE)
发表日期
2015-10-30
DOI
10.1109/ted.2015.2491021

向作者/读者发起求助以获取更多资源

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now