In Situ Process Control of Trilayer Gate-Stacks on p-Germanium With 0.85-nm EOT

出版年份 2015 全文链接

标题

作者

关键词

出版物

Volume 36, Issue 9, Pages 881-883

出版商

Institute of Electrical and Electronics Engineers (IEEE)

发表日期

2015-07-23

DOI

10.1109/led.2015.2459663

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