Effect of deposition parameters on structural, mechanical and electrochemical properties in Ti/TiN thin films on AISI 316L substrates produced by r. f. magnetron sputtering

标题
Effect of deposition parameters on structural, mechanical and electrochemical properties in Ti/TiN thin films on AISI 316L substrates produced by r. f. magnetron sputtering
作者
关键词
Ti/TiN thin films, XPS, Microstructure, Electrochemical performance, Hardness
出版物
JOURNAL OF ALLOYS AND COMPOUNDS
Volume 746, Issue -, Pages 688-698
出版商
Elsevier BV
发表日期
2018-03-02
DOI
10.1016/j.jallcom.2018.02.319

向作者/读者发起求助以获取更多资源

Reprint

联系作者

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started