4.6 Article

Vertical-Structured Electron-Hole Bilayer Tunnel Field-Effect Transistor for Extremely Low-Power Operation With High Scalability

期刊

IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 65, 期 5, 页码 2010-2015

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2018.2817569

关键词

Electron-hole bilayer tunnel field-effect transistor (EHBTFET); low-power operation (LOP); steep switching; subthreshold swing; tunnel FET (TFET)

资金

  1. MOTIE/KSRC [10044842, 10080575]
  2. NRF of Korea - Ministry of Education [2017R1D1A1B03034352]

向作者/读者索取更多资源

In this paper, a novel vertical-structured electron-hole bilayer tunnel field-effect transistor (V-EHBTFET), which features dual gates located at each side of Si fin, is proposed and its electrical characteristics are examined by a technology computer-aided design simulation depending on device parameters. Comparing with the conventional EHBTFET, V-EHBTFET shows a comparable performance in terms of subthreshold swing, OFF- and ON-state currents, and turn-ON voltage with much higher scalability with the help of a novel device architecture. An exemplary self-aligned process flow is also proposed.

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