期刊
IEEE ELECTRON DEVICE LETTERS
卷 39, 期 9, 页码 1366-1369出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2018.2852699
关键词
Dynamic I-OFF; hole injection; p-GaN HEMTs; ohmic gate contact
资金
- Hong Kong Innovation and Technology Fund [ITS/412/17FP]
- Shenzhen Science and Technology Innovation Commission [JCYJ20160229205511222]
- Ministry of Science and Technology of the People's Republic of China [2017YFB0403002]
The OFF-state drain leakage characteristics in 600-V p-GaN HEMTs with an ohmic gate contact are investigated under dynamic switching conditions instead of commonly used quasi-static measurement setup. It is found that fast dynamic OFF-state leakage current (dynamic I-OFF) is substantially higher than the slow-ramping quasi-static I-OFF due to the weaker trapping effect in the buffer layer. With sufficiently large positive ON-state gate bias, further increase in dynamic I-OFF is observed and is attributed to ON-state hole injection that leads to energy band lowering in the buffer. The underlying physical processes are explained by the dynamic behavior of the traps in the buffer layer. This letter indicates that the I-OFF under practical switching operations is much higher than the static measurement results and should be used to evaluate dynamic OFF-state power consumption in the p-GaN HEMTs with an ohmic gate contact.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据