Nucleation layer design for growth of a high-quality AlN epitaxial film on a Si(111) substrate
出版年份 2018 全文链接
标题
Nucleation layer design for growth of a high-quality AlN epitaxial film on a Si(111) substrate
作者
关键词
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出版物
CRYSTENGCOMM
Volume 20, Issue 11, Pages 1483-1490
出版商
Royal Society of Chemistry (RSC)
发表日期
2018-02-16
DOI
10.1039/c7ce02126g
参考文献
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注意:仅列出部分参考文献,下载原文获取全部文献信息。- Growth of high-quality AlN epitaxial film by optimizing the Si substrate surface
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