期刊
COORDINATION CHEMISTRY REVIEWS
卷 360, 期 -, 页码 77-91出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.ccr.2018.01.005
关键词
Dielectric; Low-kappa; Metal-organic framework; Microelectronics
资金
- Academia Sinica
- Ministry of Science and Technology, Taiwan
Metal-organic frameworks (MOFs) belong to a class of hybrid materials that are unparalleled in their degree of structural diversity and functional tunability. The construction of these crystalline materials promise to advance the burgeoning field of ultra-low dielectrics. The rapid development of ultra-large-scale integration (ULSI) and the continuous miniaturization of feature sizes of integrated circuits approaching the nanometer (nm) scale, suggest that ultra-low dielectric constant materials will be needed, instead of the traditional SiO2 (kappa = 3.9). Appropriately designed MOFs promise to be the next generation of interlayer low-dielectric materials with the potential to be extremely porous, inert, and insulating. This review discusses our comprehensive investigations of obtaining low-kappa MOFs and provides the current state of MOF research for dielectric applications. The design principles that are required to develop low-dielectric MOFs and structural elements that influence their behavior, as well as the integration of MOFs into metal-insulator-metal (MIM) devices are discussed. (C) 2018 Elsevier B.V. All rights reserved.
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