Spectral artefacts post sputter-etching and how to cope with them – A case study of XPS on nitride-based coatings using monoatomic and cluster ion beams

标题
Spectral artefacts post sputter-etching and how to cope with them – A case study of XPS on nitride-based coatings using monoatomic and cluster ion beams
作者
关键词
Sputter artefacts, Ion-etching, X-ray photoelectron spectroscopy, XPS, Gas-cluster ion beams, GCIB, Coating materials, Nitrides
出版物
APPLIED SURFACE SCIENCE
Volume 442, Issue -, Pages 487-500
出版商
Elsevier BV
发表日期
2018-02-21
DOI
10.1016/j.apsusc.2018.02.191

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