标题
Impurity dominated thin film growth
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 112, Issue 22, Pages 221903
出版商
AIP Publishing
发表日期
2018-05-30
DOI
10.1063/1.5021528
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- The nanostructure and mechanical properties of nanocomposite Nb x -CoCrCuFeNi thin films
- (2017) B.R. Braeckman et al. SCRIPTA MATERIALIA
- Impurity-controlled film growth and elastic properties of CoCrCuFeNi thin films
- (2017) B.R. Braeckman et al. SURFACE & COATINGS TECHNOLOGY
- A three-dimensional polyhedral unit model for grain boundary structure in fcc metals
- (2017) Arash Dehghan Banadaki et al. npj Computational Materials
- Topologically close-packed phases: Deposition and formation mechanism of metastable β-W in thin films
- (2016) Jiaxing Liu et al. ACTA MATERIALIA
- Quantitative correlation between intrinsic stress and microstructure of thin films
- (2016) D. Depla et al. THIN SOLID FILMS
- Influence of oxygen impurities on growth morphology, structure and mechanical properties of Ti–Al–N thin films
- (2016) H. Riedl et al. THIN SOLID FILMS
- Stress engineering using low oxygen background pressures during Volmer–Weber growth of polycrystalline nickel films
- (2015) Hang Z. Yu et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- Texture change of TiN films due to anisotropic incorporation of oxygen
- (2014) D. Biro et al. VACUUM
- On the evolution of residual stress at different substrate temperatures in sputter-deposited polycrystalline Mo thin films by x-ray diffraction
- (2014) Ch Kishan Singh et al. Materials Research Express
- Continuous graphene films synthesized at low temperatures by introducing coronene as nucleation seeds
- (2013) Tianru Wu et al. Nanoscale
- Impurity-controlled Mo films as diffusion barriers for Cu metallization
- (2012) Gil Ho Gu et al. METALS AND MATERIALS INTERNATIONAL
- Effect of small concentrations of oxygen and nitrogen on the structure and mechanical properties of sputtered titanium films
- (2012) S. Firstov et al. SURFACE & COATINGS TECHNOLOGY
- Role of oxygen impurity in growth and magnetic properties of Ni83Fe17 permalloy thin films
- (2010) P. Chowdhury et al. JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
- Effects of deposition parameters on tantalum films deposited by direct current magnetron sputtering
- (2009) Y. M. Zhou et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- Method to Determine the Sticking Coefficient of O2on Deposited Al During Reactive Magnetron Sputtering, Using Mass Spectrometry
- (2009) Wouter P. Leroy et al. Plasma Processes and Polymers
- Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: The method and results
- (2009) W.P. Leroy et al. THIN SOLID FILMS
- New measures of sharpness for symmetric powder diffraction peak profiles
- (2008) Takashi Ida JOURNAL OF APPLIED CRYSTALLOGRAPHY
- Effects of deposition parameters on tantalum films deposited by direct current magnetron sputtering
- (2008) Y.M. Zhou et al. VACUUM
Add your recorded webinar
Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.
Upload NowBecome a Peeref-certified reviewer
The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.
Get Started