Novel Cyclosilazane-Type Silicon Precursor and Two-Step Plasma for Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride

标题
Novel Cyclosilazane-Type Silicon Precursor and Two-Step Plasma for Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride
作者
关键词
-
出版物
ACS Applied Materials & Interfaces
Volume 10, Issue 10, Pages 9155-9163
出版商
American Chemical Society (ACS)
发表日期
2018-02-21
DOI
10.1021/acsami.7b19741

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