High resolution residual stress gradient characterization in W/TiN-stack on Si(100): Correlating in-plane stress and grain size distributions in W sublayer

标题
High resolution residual stress gradient characterization in W/TiN-stack on Si(100): Correlating in-plane stress and grain size distributions in W sublayer
作者
关键词
Ion beam layer removal, Residual stress profile, Grain size distribution, Nanocrystalline, Tungsten thin film, Hall-Petch
出版物
MATERIALS & DESIGN
Volume 132, Issue -, Pages 72-78
出版商
Elsevier BV
发表日期
2017-06-23
DOI
10.1016/j.matdes.2017.06.052

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