Electron-Beam-Induced Deposition as a Technique for Analysis of Precursor Molecule Diffusion Barriers and Prefactors

标题
Electron-Beam-Induced Deposition as a Technique for Analysis of Precursor Molecule Diffusion Barriers and Prefactors
作者
关键词
-
出版物
ACS Applied Materials & Interfaces
Volume 7, Issue 38, Pages 21408-21415
出版商
American Chemical Society (ACS)
发表日期
2015-09-05
DOI
10.1021/acsami.5b06341

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