Low temperature growth of graphene using inductively-coupled plasma chemical vapor deposition

标题
Low temperature growth of graphene using inductively-coupled plasma chemical vapor deposition
作者
关键词
Graphene, Inductively-coupled plasma, Chemical vapor deposition
出版物
SURFACE & COATINGS TECHNOLOGY
Volume 309, Issue -, Pages 814-819
出版商
Elsevier BV
发表日期
2016-10-28
DOI
10.1016/j.surfcoat.2016.10.081

向作者/读者发起求助以获取更多资源

Reprint

联系作者

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started