Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons

标题
Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons
作者
关键词
-
出版物
OPTICS EXPRESS
Volume 25, Issue 17, Pages 20511
出版商
The Optical Society
发表日期
2017-08-16
DOI
10.1364/oe.25.020511

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