4.8 Article

Sculpting Fano Resonances To Control Photonic-Plasmonic Hybridization

期刊

NANO LETTERS
卷 17, 期 11, 页码 6927-6934

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.7b03332

关键词

Microresonator; nanophotonics; Purcell effect; Fano interference

资金

  1. NSF [DMR-1610345, CHE-1664684, DGE-1256082, DGE-1256259]
  2. Division Of Materials Research
  3. Direct For Mathematical & Physical Scien [1610345] Funding Source: National Science Foundation

向作者/读者索取更多资源

Hybrid photonic-plasmonic systems have tremendous potential as versatile platforms for the study and control of nanoscale light-matter interactions since their respective components have either high-quality factors or low mode volumes. Individual metallic nanoparticles deposited on optical microresonators provide an excellent example where ultrahigh-quality optical whispering-gallery modes can be combined with nanoscopic plasmonic mode volumes to maximize the system's photonic performance. Such optimization, however, is difficult in practice because of the inability to easily measure and tune critical system parameters. In-this Letter, we present a general and practical method, to determine the coupling strength and tailor the degree of hybridization in composite optical microresonator-plasmonic nanoparticle systems based on experimentally measured absorption spectra. Specifically, we use thermal annealing to control the detuning between a metal nanoparticle's localized surface plasmon resonance and the whispering-gallery modes of an optical microresonator cavity. We demonstrate the ability to sculpt Fano resonance lineshapes in the absorption spectrum and infer system parameters critical to elucidating the underlying photonic-plasmonic hybridization. We show that including decoherence processes is necessary to capture the evolution of the lineshapes. As a result, thermal annealing allows us to directly tune the degree of hybridization and various hybrid mode quantities such as the quality factor and mode volume and ultimately maximize the Purcell factor to be 10(4).

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