Low-temperature-atomic-layer-deposition of SiO2 using various organic precursors

标题
Low-temperature-atomic-layer-deposition of SiO2 using various organic precursors
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 35, Issue 1, Pages 01B131
出版商
American Vacuum Society
发表日期
2016-12-21
DOI
10.1116/1.4972211

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