Etching with atomic precision by using low electron temperature plasma

标题
Etching with atomic precision by using low electron temperature plasma
作者
关键词
-
出版物
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 50, Issue 27, Pages 274003
出版商
IOP Publishing
发表日期
2017-06-19
DOI
10.1088/1361-6463/aa7357

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