Sequential Infiltration Synthesis for Line Edge Roughness Mitigation of EUV Resist

标题
Sequential Infiltration Synthesis for Line Edge Roughness Mitigation of EUV Resist
作者
关键词
-
出版物
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
Volume 30, Issue 6, Pages 667-670
出版商
Technical Association of Photopolymers, Japan
发表日期
2018-01-15
DOI
10.2494/photopolymer.30.667

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