期刊
JOURNAL OF CRYSTAL GROWTH
卷 480, 期 -, 页码 67-73出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2017.10.009
关键词
Nanostructures; Molecular beam epitaxy; Nitrides; Glasses; Semiconducting III-V materials
资金
- FRINATEK program of Research Council of Norway [214235]
- NANO program of Research Council of Norway [239206]
- Japan Society for the Promotion of Science KAKENHI [24000013]
- Research Council of Norway [197411]
- NORTEM [197405]
- Norwegian PhD Network on Nanotechnology for Microsystems [FORSKERSKOLER-221860/F40]
We demonstrate GaN nanocolumn growth on fused silica glass by plasma-assisted molecular beam epitaxy. The effect of the substrate temperature, Ga flux and N-2 flow rate on the structural and optical properties are studied. At optimum growth conditions, GaN nanocolumns are vertically aligned and well separated with an average diameter, height and density of 72 nm, 1.2 mu m and 1.6 x 10(9) cm(-2), respectively. The nanocolumns exhibit wurtzite crystal structure with no threading dislocations, stacking faults or twinning and grow in the [0001] direction. At the interface adjacent to the glass, there is a few atom layers thick intermediate phase with ABC stacking order (zinc blende). Photoluminescence measurements evidence intense and narrow excitonic emissions, along with the absence of any defect-related zinc blende and yellow luminescence emission. (C) 2017 Elsevier B.V. All rights reserved.
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