4.7 Article

Formation of Vzn-No acceptors with the assistance of tellurium in nitrogen-doped ZnO films

期刊

JOURNAL OF ALLOYS AND COMPOUNDS
卷 699, 期 -, 页码 484-488

出版社

ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2016.12.395

关键词

Zinc oxide; Shallow acceptor; Tellurium and nitrogen co-doping; Nitrogen complex

资金

  1. State Key Program for Basic Research of China [2011CB302003]
  2. National Natural Science Foundation of China [61274058, 61322403, 61504057, 61574075, 61674077]
  3. Natural Science Foundation of Jiangsu Province [BK20130013, BK20150585]

向作者/读者索取更多资源

We report the formation of Vzn-No complex shallow acceptors in ZnO films. Through tellurium and nitrogen co-doping under O-rich growth condition, a Tezn-No complex can be stably formed. A proper 0 rich post-annealing process can make tellurium out of the films, and finally results in the formation of Vzn-No complex. This process has been evidenced by a set of characterization methods. Utilizing this approach, hole majority has been realized for a large windows of nitrogen concentration. Therefore, this study may help to advance the investigation on the p-type bottleneck of ZnO material. (C) 2016 Elsevier B.V. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.7
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据