RF plasma cleaning of silicon substrates with high-density polyethylene contamination

标题
RF plasma cleaning of silicon substrates with high-density polyethylene contamination
作者
关键词
-
出版物
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 57, Issue 1S, Pages 01AB04
出版商
Japan Society of Applied Physics
发表日期
2017-11-14
DOI
10.7567/jjap.57.01ab04

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