Improving the hydrogen gas sensitivity of WO 3 thin films by modifying the deposition angle and thickness of different promoter layers

标题
Improving the hydrogen gas sensitivity of WO 3 thin films by modifying the deposition angle and thickness of different promoter layers
作者
关键词
Thin film, WO, 3, Sensitivity, Hydrogen, Promoter layer
出版物
INTERNATIONAL JOURNAL OF HYDROGEN ENERGY
Volume 42, Issue 49, Pages 29620-29628
出版商
Elsevier BV
发表日期
2017-11-01
DOI
10.1016/j.ijhydene.2017.10.027

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