期刊
IEEE ELECTRON DEVICE LETTERS
卷 38, 期 9, 页码 1204-1207出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2017.2723319
关键词
High-k-metal gate; charge-trapping; unsupervised learning; neuromorphic computing
资金
- DARPA [FA8650-16-1-7648]
- GlobalFoundries
- IBM
Unsupervised learning is demonstrated using a device ubiquitously found in today's technology: a transistor with high-k-metal gate. Specifically, the charge-trapping phenomenon in the high-k gate dielectric is leveraged so that the devicecan be used as a non-volatile analog memory. Experimental data from 22-nm silicon-on-insulator devices reveal that a charge-trap transistor possesses promising characteristics for implementing synapses in neural networks, such as very fine tunability, weight-dependent plasticity, and low power consumption. A proof-of-concept winner-takes-all neural network is simulated based on experimental data and perfect clustering is achieved within tens of training cycles. This means that the network can be trained for multiple times, and a larger system can be built. The robustness of the procedure to the device variation is also discussed.
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