Cross-sectional stress distribution in Al x Ga 1-x N heterostructure on Si(111) substrate characterized by ion beam layer removal method and precession electron diffraction

标题
Cross-sectional stress distribution in Al x Ga 1-x N heterostructure on Si(111) substrate characterized by ion beam layer removal method and precession electron diffraction
作者
关键词
Heterostructure, Residual stress, Ion beam layer removal method, GaN, FIB, Precession electron diffraction
出版物
MATERIALS & DESIGN
Volume 106, Issue -, Pages 476-481
出版商
Elsevier BV
发表日期
2016-06-03
DOI
10.1016/j.matdes.2016.06.001

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