Fabrication of topographically microstructured titanium silicide interface for advanced photonic applications

出版年份 2016 全文链接

标题

作者

关键词

Atomic layer deposition (ALD), X-ray photoelectron spectroscopy (XPS), Transition metal silicides, Semiconductors, Surface modification

出版物

Volume 119, Issue -, Pages 76-81

出版商

Elsevier BV

发表日期

2016-04-19

DOI

10.1016/j.scriptamat.2016.03.016

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