4.7 Article

Sessile nanofluid droplet drying

期刊

ADVANCES IN COLLOID AND INTERFACE SCIENCE
卷 217, 期 -, 页码 13-30

出版社

ELSEVIER
DOI: 10.1016/j.cis.2014.12.003

关键词

Nanofluid; Sessile droplet; Evaporative dynamics; Drying patterns

资金

  1. A*Star Public Sector Funding [1121202010]

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Nanofluid droplet evaporation has gained much audience nowadays due to its wide applications in painting, coating, surface patterning, particle deposition, etc. This paper reviews the drying progress and deposition formation from the evaporative sessile droplets with the suspended insoluble solutes, especially nanoparticles. The main content covers the evaporation fundamental, the particle self-assembly, and deposition patterns in sessile nanofluid droplet. Both experimental and theoretical studies are presented. The effects of the type, concentration and size of nanoparticles on the spreading and evaporative dynamics are elucidated at first, serving the basis for the understanding of particle motion and deposition process which are introduced afterward. Stressing on particle assembly and production of desirable residue patterns, we express abundant experimental interventions, various types of deposits, and the effects on nanoparticle deposition. The review ends with the introduction of theoretical investigations, including the Navier-Stokes equations in terms of solutions, the Diffusion Limited Aggregation approach, the Kinetic Monte Carlo method, and the Dynamical Density Functional Theory. Nanoparticles have shown great influences in spreading, evaporation rate, evaporation regime, fluid flow and pattern formation of sessile droplets. Under different experimental conditions, various deposition patterns can be formed. The existing theoretical approaches are able to predict fluid dynamics, particle motion and deposition patterns in the particular cases. On the basis of further understanding of the effects of fluid dynamics and particle motion, the desirable patterns can be obtained with appropriate experimental regulations. (C) 2014 Elsevier B.V. All rights reserved.

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