Morphological, optical and X-ray photoelectron chemical state shift investigations of ZnO thin films

标题
Morphological, optical and X-ray photoelectron chemical state shift investigations of ZnO thin films
作者
关键词
Chemical state analysis, Atomic layer deposition (ALD), X-ray diffractometer (XRD), X-ray photoelectron spectroscopy (XPS), Field emission scanning electron microscope (FESEM)
出版物
OPTIK
Volume 127, Issue 16, Pages 6358-6365
出版商
Elsevier BV
发表日期
2016-05-20
DOI
10.1016/j.ijleo.2016.04.127

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