3.8 Article

Study of the Characteristics and Parameters of Plasma of Overvoltage Nanosecond Discharge in Krypton between the Electrodes of a Superionic Conductor-Silver Sulphide

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PLEIADES PUBLISHING INC
DOI: 10.3103/S1068375523050162

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overvoltage nanosecond atmospheric pressure discharge; plasma; krypton; thin films; silver sulfide; radiation

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This study investigates the electrical and optical characteristics of an overvoltage nanosecond atmospheric pressure discharge between electrodes made of a superionic conductor (Ag2S) in krypton. It is found that the destruction of electrodes and the introduction of Ag2S vapor into the interelectrode gap occur due to microexplosions of inhomogeneities on the working surfaces of polycrystalline electrodes. Numerical calculations reveal the electron energy distribution function, discharge temperature and density, specific discharge power losses, and rate constants of electronic processes in the plasma based on krypton and silver sulfide.
The results of a study into the electrical and optical characteristics of an overvoltage nanosecond atmospheric pressure discharge between electrodes made of a superionic conductor (SIC) (Ag2S) in krypton are presented. The destruction of electrodes in the discharge and the introduction of Ag2S vapor into the interelectrode gap occurred due to the microexplosions of inhomogeneities on the working surfaces of polycrystalline electrodes (the formation of ectons) in order to synthesize thin films based on this compound on the surface of a dielectric substrate mounted near the electrodes. Numerically solving the Boltzmann kinetic equation for the electron energy distribution function, the temperature and the electron density in the discharge, the specific discharge power losses for the main electronic processes, and the rate constants of the electronic processes depending on the parameter E/N for the plasma of vapor-gas mixtures based on krypton and silver sulfide have been calculated. Homogeneous thin films based on silver sulfide are synthesized on the quartz substrates by the gas-discharge method under conditions of ultraviolet assisted discharge plasma.

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