Article
Chemistry, Physical
Hyeok Jae Lee, Seo Young Jang, Hye Min Lee, Ju Young Sung, Se Eun Kim, Jae Deock Jeon, Yewon Yun, Sang Woon Lee
Summary: Transition metal nitride thin films, such as TiN, are essential for memory and transistor devices as conducting electrodes. Recently, NbN thin films with a high work function (> 4.7 eV) have gained attention as replacements for TiN thin films in capacitor electrodes to reduce leakage currents. However, the conventional NbN ALD process resulted in high resistivity (> 500 mu omega center dot cm) due to residual Cl impurity (> 5%). This study proposes an alternative ALD surface reaction using H2S gas pulses to lower the Cl impurity concentration, leading to a significant decrease in resistivity (> 30%) of NbN thin films compared to the conventional NbN ALD process.
JOURNAL OF ALLOYS AND COMPOUNDS
(2023)
Article
Chemistry, Physical
Jon G. Baker, Joel R. Schneider, Camila de Paula, Adriaan J. M. Mackus, Stacey F. Bent
Summary: This study investigates the surface-directed modification of Ni(OH)(2)/Ni(OOH) electrocatalysts using ALD, revealing the important role of surface iron in enhancing the oxygen evolution reaction activity, as well as the impact of iron distribution throughout the structure. Incorporation of iron throughout the Ni(OH)(2)/Ni(OOH) structure was found to increase OER geometric activity for thick, high surface area catalysts. Additionally, Ni-FeOx electrocatalysts synthesized fully by ALD show high OER activity and potential for photocatalysis applications.
JOURNAL OF CATALYSIS
(2021)
Article
Chemistry, Multidisciplinary
Ashley R. R. Bielinski, Ethan P. P. Kamphaus, Lei Cheng, Alex B. F. Martinson
Summary: In this study, in situ pyroelectric calorimetry and spectroscopic ellipsometry were used to investigate the surface reactions in atomic layer deposition of zirconium oxide. The results revealed that the reaction heat is dependent on factors such as growth rate, equilibrium surface hydroxylation, and extent of the reaction.
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION
(2023)
Review
Engineering, Manufacturing
Jinxiong Li, Gaoda Chai, Xinwei Wang
Summary: Atomic layer deposition (ALD) has become an essential thin-film technology in the microelectronics industry due to its self-limited layer-by-layer growth feature and the ability to deposit conformal pinhole-free thin films with precise thickness control, especially on 3D structures. This review focuses on the surface chemistry and precursor chemistry aspects of ALD, providing a comprehensive understanding of the involved chemistry to further advance and utilize this technology. The surface chemistry of the gas-solid ALD reactions and the precursor chemistry used in ALD processes are discussed, along with emerging applications in microelectronics and future perspectives of the ALD technology.
INTERNATIONAL JOURNAL OF EXTREME MANUFACTURING
(2023)
Article
Chemistry, Physical
Martijn F. J. Vos, Harm C. M. Knoops, Wilhelmus M. M. Kessels, Adriaan J. M. Mackus
Summary: This study investigated the reaction mechanisms of fluorides ALD using a fluorine-containing plasma, showing that F radicals from the SF6 plasma eliminate CH3 ligands after precursor dosing for the fluorination reaction. These insights can aid in developing ALD processes for other metal fluorides using a fluorine-containing plasma.
JOURNAL OF PHYSICAL CHEMISTRY C
(2021)
Article
Multidisciplinary Sciences
Jie Fu, Zeyu Fan, Mamiko Nakabayashi, Huanxin Ju, Nadiia Pastukhova, Yequan Xiao, Chao Feng, Naoya Shibata, Kazunari Domen, Yanbo Li
Summary: Interface engineering is an effective strategy to improve the efficiency of thin film semiconductor based solar energy conversion devices. In this study, n-type In:GaN and p-type Mg:GaN were employed to modify the bottom and top interfaces of Ta3N5 thin film photoanode, resulting in significant enhancements in efficiency.
NATURE COMMUNICATIONS
(2022)
Article
Chemistry, Multidisciplinary
Yuanlu Tsai, Zhiteng Li, Shaojie Hu
Summary: This article reviews the current developments in atomic layer technology for spintronics, including atomic layer deposition (ALD) and atomic layer etching (ALE). The importance of these techniques in device fabrication is discussed, along with their applications in various materials. The article also compares the critical factors of ALD and ALE and explores the future prospects and challenges of atomic layer technology in spintronics.
Article
Materials Science, Coatings & Films
Arun Haridas Choolakkal, Hans Hogberg, Jens Birch, Henrik Pedersen
Summary: We demonstrate the conformal chemical vapor deposition of boron carbide thin films using triethylboron as a single source precursor on silicon substrates with 8:1 aspect-ratio morphologies. The films deposited at temperatures below 450°C exhibit excellent step coverage, attributed to the low reaction probability at lower temperatures. The boron carbide films are determined to have B-B, B-C, C-B, and C-C chemical bonds and show a boron-rich composition of approximately B5C.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
(2023)
Article
Materials Science, Coatings & Films
Hanjorg Wagner, Valentin Ripka, Andrea Dellith, Jan Dellith, Florian Wittkaemper, Uwe Hubner, Mario Ziegler
Summary: This paper reports the testing of high performance plasmonic broadband absorbing black coatings fabricated by metastable atomic layer deposition (MS-ALD) for space applications. Humidity testing, thermal cycling, exposure to atomic oxygen, and adhesion testing were used as testing methods. The results show that the films with thickness greater than 9 μm are able to withstand the humidity tests, thermal cycling, and exposure to atomic oxygen without significant loss of their broadband absorption. However, the adhesion of the films has not yet been sufficient to meet the requirements posed by the space environment. Therefore, the authors propose to investigate the coating of the MS-ALD films with high refractive index coatings.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
(2023)
Review
Engineering, Multidisciplinary
JunJie Yang, YouQiang Xing, Ze Wu, Peng Huang, Lei Liu
Summary: ALD technique is able to produce ultrathin or two-dimensional MoS2 films with precise thickness control and excellent uniformity. The surface reaction pathway and growth mechanisms of ALD synthesis MoS2 are discussed in detail. The deposition process consists of heterogeneous and homogeneous stages, with the mismatch between the as-deposited MoS2 and substrate surface lattice structure affecting the crystallinity. Methods to improve the quality of deposited films are also discussed.
SCIENCE CHINA-TECHNOLOGICAL SCIENCES
(2021)
Article
Electrochemistry
Ivan Spajic, Ehsan Rahimi, Maria Lekka, Ruben Offoiach, Lorenzo Fedrizzi, Ingrid Milosev
Summary: Thin films of alumina and hafnia prepared by atomic layer deposition show excellent barrier properties for biomedical applications, with protection mainly dependent on film thickness and substrate type, rather than configuration. Further investigation is warranted for these single and multilayer thin films.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
(2021)
Article
Nanoscience & Nanotechnology
Nga Phung, Marcel Verheijen, Anna Todinova, Kunal Datta, Michael Verhage, Amran Al-Ashouri, Hans Koebler, Xin Li, Antonio Abate, Steve Albrecht, Mariadriana Creatore
Summary: Metal halide perovskites have excellent electronic properties, and recent advancements in device performance and stability of perovskite solar cells have been achieved with the application of self-assembled monolayers (SAMs). By introducing an intermediate layer of NiO between ITO and SAM, the coverage and homogeneity of SAMs on the substrate can be improved, leading to enhanced device performance. The combination of NiO and SAM results in a more than 20% efficient champion device with a narrower distribution of performance.
ACS APPLIED MATERIALS & INTERFACES
(2022)
Article
Chemistry, Physical
Romel Hidayat, Hye-Lee Kim, Khabib Khumaini, Tanzia Chowdhury, Tirta Rona Mayangsari, Byungchul Cho, Sangjoon Park, Won-Jun Lee
Summary: Selective etching of silicon oxide (SiO2) against silicon (Si) using anhydrous hydrogen fluoride (HF) vapor has been studied. The density functional theory (DFT) calculation shows that SiO2 can be etched by HF at near-room temperature due to the relatively low activation energies of the fluorination steps. In contrast, the fluorinations of Si have higher activation energies, indicating negligible etching of silicon by HF in the near-room temperature process. The calculation results explain well the experimental observation of the selective etching of SiO2 against Si by HF vapor.
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
(2023)
Article
Multidisciplinary Sciences
Li -Ting Tseng, Prajith Karadan, Dimitrios Kazazis, Procopios C. Constantinou, Taylor J. Z. Stock, Neil J. Curson, Steven R. Schofield, Matthias Muntwiler, Gabriel Aeppli, Yasin Ekinci
Summary: We demonstrate the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated silicon (100) surface without a photoresist. This is significant because EUV lithography, the leading technique in semiconductor manufacturing, faces limitations in resolution caused by the resists used. Our research shows that EUV photons can induce surface reactions on a hydrogen-terminated silicon surface and assist the growth of an oxide layer as an etch mask. We achieve silicon dioxide/silicon gratings with a half-pitch of 75 nanometers and a height of 31 nanometers, proving the effectiveness of resistless EUV lithography.
Review
Biochemistry & Molecular Biology
Matthew Sullivan, Peng Tang, Xiangbo Meng
Summary: This review examines the surface coatings via ALD and MLD and comparatively analyzes their effects on improving the safety and stability of alkali metal anodes.
Article
Chemistry, Multidisciplinary
Yifei Qi, Jumin Lee, Xi Cheng, Rong Shen, Shahidul M. Islam, Benoit Roux, Wonpil Im
JOURNAL OF COMPUTATIONAL CHEMISTRY
(2020)
Article
Chemistry, Multidisciplinary
Wanzhen Zheng, Jian Yang, Hengquan Chen, Yang Hou, Qi Wang, Meng Gu, Feng He, Ying Xia, Zheng Xia, Zhongjian Li, Bin Yang, Lecheng Lei, Chris Yuan, Qinggang He, Ming Qiu, Xinliang Feng
ADVANCED FUNCTIONAL MATERIALS
(2020)
Article
Nanoscience & Nanotechnology
Yuanyuan Fu, Tingting Wang, Wanzhen Zheng, Chaojun Lei, Bin Yang, Jian Chen, Zhongjian Li, Lecheng Lei, Chris Yuan, Yang Hou
ACS APPLIED MATERIALS & INTERFACES
(2020)
Article
Nanoscience & Nanotechnology
Hanlin Chen, Jincheng Si, Siliu Lyu, Tianyu Zhang, Zhongjian Li, Chaojun Lei, Lecheng Lei, Chris Yuan, Bin Yang, Liguo Gao, Yang Hou
ACS APPLIED MATERIALS & INTERFACES
(2020)
Article
Chemistry, Physical
Han Wang, Jincheng Si, Tianyu Zhang, Yan Li, Bin Yang, Zhongjian Li, Jian Chen, Zhenhai Wen, Chirs Yuan, Lecheng Lei, Yang Hou
APPLIED CATALYSIS B-ENVIRONMENTAL
(2020)
Article
Green & Sustainable Science & Technology
Fenfen Wang, Yelin Deng, Chris Yuan
JOURNAL OF CLEANER PRODUCTION
(2020)
Article
Chemistry, Physical
Xinyou Ke, Yan Wang, Liming Dai, Chris Yuan
ENERGY STORAGE MATERIALS
(2020)
Article
Engineering, Environmental
Fan Yang, Yuanyuan Xie, Yelin Deng, Chris Yuan
Summary: This study uses a mathematical model to evaluate the economic and environmental benefits of EVs compared to ICEVs over a 10-year operation phase, finding that EV energy consumption increases over time, affecting the potential GHG emissions reduction and cost savings from replacing ICEVs. At the state level, some areas may experience negative environmental and economic impacts from adopting EVs during the operation phase after considering battery replacement.
RESOURCES CONSERVATION AND RECYCLING
(2021)
Article
Engineering, Environmental
Jingyi Zhang, Xinyou Ke, Yu Gu, Fenfen Wang, Duanyang Zheng, Kang Shen, Chris Yuan
Summary: All-solid-state lithium-ion batteries (ASSLIBs) have attracted attention due to their higher safety, energy density, and operating temperature range. However, their manufacturing process is energy-intensive with significant environmental impacts compared to conventional lithium-ion batteries (LIBs). It is crucial to reduce energy consumption, improve energy efficiency, and overcome technological barriers for the sustainable development of ASSLIBs.
INTERNATIONAL JOURNAL OF LIFE CYCLE ASSESSMENT
(2022)
Review
Materials Science, Multidisciplinary
Fenfen Wang, Xinyou Ke, Kang Shen, Lei Zhu, Chris Yuan
Summary: This review discusses recent research and development on thermally stable separators for lithium-ion batteries, including surface modified polyolefin separators, novel polymer separators, inorganic structured separators, and functional smart separators. Different techniques, processes, and materials are summarized for improving the safety of lithium-ion batteries through these separators.
ADVANCED MATERIALS TECHNOLOGIES
(2022)
Article
Engineering, Electrical & Electronic
Kang Shen, Xinyou Ke, Fan Yang, Weibo Wang, Cheng Zhang, Chris Yuan
Summary: This study explores the energy consumption, efficiency improvement, and greenhouse gas emissions of a mid-size autonomous EV driven by in-wheel motors. The results show that an IWM-driven AEV can save energy during slope driving and reduce greenhouse gas emissions.
IEEE TRANSACTIONS ON TRANSPORTATION ELECTRIFICATION
(2023)
Article
Engineering, Industrial
Kang Shen, Chris Yuan, Michael Hauschild
Summary: This study presents a process-based life cycle assessment model to analyze the environmental impacts of direct recycling for closed-loop production of lithium ion batteries. The results show that direct recycling can reduce environmental impacts by up to 54% compared to conventional open-loop battery manufacturing.
CIRP ANNALS-MANUFACTURING TECHNOLOGY
(2023)
Article
Engineering, Industrial
Chris Yuan, Huajun Cao, Kang Shen, Yelin Deng, Dan Zeng, Yan Dong, Michael Hauschild
Summary: Water-based manufacturing processes for lithium ion batteries show potential for reducing energy consumption and minimizing environmental impacts compared to conventional manufacturing methods.
CIRP ANNALS-MANUFACTURING TECHNOLOGY
(2021)
Review
Chemistry, Physical
Xinyou Ke, Yan Wang, Guofeng Ren, Chris Yuan
ENERGY STORAGE MATERIALS
(2020)
Proceedings Paper
Engineering, Industrial
Cheng Zhang, Kang Shen, Fan Yang, Chris Yuan
26TH CIRP CONFERENCE ON LIFE CYCLE ENGINEERING (LCE)
(2019)
Article
Engineering, Chemical
Andrea Coletto, Pietro Poesio
Summary: Experiments and simulations were conducted to study the air volume fraction and hold-up in a bubble channel reactor. A new signal processing method was proposed to avoid the loss of bubble residence time. The results were in agreement with previous studies and a bubble-scale model was developed to explain the relationship between hold-up and air superficial velocity.
CHEMICAL ENGINEERING RESEARCH & DESIGN
(2024)